The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7534533 B1

PDF
Full Text
Expired
Date of Patent:
May. 19, 2009

Filed:

Feb. 09, 2005
Applicants:

Ayako Nakano, Yokohama, JP;

Takashi Sato, Fujisawa, JP;

Inventors:

Ayako Nakano, Yokohama, JP;

Takashi Sato, Fujisawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polarization analyzing system includes a data collector collecting information on resist patterns formed over step patterns by first and second lights, the first and second lights being polarized parallel and perpendicular to the step patterns, a residual resist analyzer obtaining first and second relations between a ratio of a space to a line width of the resist patterns and the first and second residues, the first and second residues remaining at orthogonal points of the step patterns and the resist patterns, and a direction chooser choosing an optimum polarization direction reducing residues by comparing the first and second relations.


Find Patent Forward Citations

Nakano, Ayako. (2009). Polarization analyzing system, exposure method, and method for manufacturing semiconductor device (U.S. Patent No. 7534533). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7534533

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