The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Jan. 27, 2005
Pei-yang Yan, Saratoga, CA (US);
Pei-Yang Yan, Saratoga, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Methods to correct a non-flatness of a mask substrate are described. At least a pair of correction layers are formed on the substrate over a non-flat region of a front surface of a substrate. A thickness of the at least the pair of the correction layers is determined by a peak-to-valley distance of the non-flat region of the substrate. A portion of the correction layers over the non-flat region is heated locally. Heating changes the thickness of the portion of the correction layers and removes the non-flat region from a top surface of the correction layers without physically removing any materials. At least the pair of the correction layers is formed on a back surface of the substrate to compensate for a stress induced by the correction layers on the front surface of the substrate.