The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2009
Filed:
Aug. 14, 2006
Huang-chin Tang, Hsinchu Hsien, TW;
Chun-hung Lin, Hsinchu Hsien, TW;
Chih-wei Chen, Hsinchu Hsien, TW;
Chin-jyi Wu, Hsinchu Hsien, TW;
Chen-der Tsai, Hsinchu Hsien, TW;
Chin-yang Lee, Hsinchu Hsien, TW;
Huang-Chin Tang, Hsinchu Hsien, TW;
Chun-Hung Lin, Hsinchu Hsien, TW;
Chih-Wei Chen, Hsinchu Hsien, TW;
Chin-Jyi Wu, Hsinchu Hsien, TW;
Chen-Der Tsai, Hsinchu Hsien, TW;
Chin-Yang Lee, Hsinchu Hsien, TW;
Industrial Technology Research Institute, Chutung Chen, Hsinchu Hsien, TW;
Abstract
A method for producing an alignment layer for a liquid crystal panel, which is produced by modifying an alignment film in a fixed direction and at a fixed angle by using an atmospheric pressure plasma source to form a uniform and isotropic alignment layer on the surface of the substrate. The resultant alignment layer has good uniformity and high anchoring energy, and the pre-tilt angle can be selected as desired. In addition, there are no problems with static charge generation, dust pollution and the like as in the prior arts. The method of the present invention is not restricted by vacuum apparatuses that need ion alignment or vacuum plasma alignment and the like and is not restricted by the size of the equipment. Therefore, the method of the present invention is suitable for treating the surface of an alignment layer of a large size liquid crystal panel.