The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2009

Filed:

Jun. 19, 2007
Applicants:

Hiroshi Matsushita, Hiratsuka, JP;

Yasutaka Arakawa, Yokohama, JP;

Junji Sugamoto, Oita, JP;

Inventors:

Hiroshi Matsushita, Hiratsuka, JP;

Yasutaka Arakawa, Yokohama, JP;

Junji Sugamoto, Oita, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 5/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A defect detection system includes a data acquiring section that acquires time series data of device parameter of each manufacturing device including an exposure device, and information on defect distribution in an area with a size smaller than a chip area size, a pattern classifying section that assembles the information on the defect distribution in units of shot or chip areas, and classifies the distributions to a defect pattern, a feature quantity calculating section that processes the time series data and calculates a feature quantity, a significant difference test section that calculates occurrence frequency distributions of the shot or chip area wherein the defect pattern to the feature quantity exists and does not exist, respectively, and determines the presence/absence of significant difference between the frequency distributions, and a defect detecting section that detects the device parameter corresponding to the feature quantity as the cause of defect of the defect pattern.


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