The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
May. 15, 2007
Applicants:
Artur Boesser, Breidenbach, DE;
Andreas Schaaf, Mittenaar-Bicken, DE;
Inventors:
Artur Boesser, Breidenbach, DE;
Andreas Schaaf, Mittenaar-Bicken, DE;
Assignee:
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector () via a measuring objective () having its optical axis () aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.