The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2009

Filed:

May. 04, 2006
Applicant:

Masahiro Matsuba, Tokyo, JP;

Inventor:

Masahiro Matsuba, Tokyo, JP;

Assignee:

Jeol Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A focused ion beam (FIB) system that can automatically set processing and scanning conditions under which a specimen is processed includes an arithmetic unit for selecting optical conditions for condenser lenses, multiple variable apertures, beam-deflecting electrodes, and an objective lens based on data entered into the input device. The arithmetic unit automatically calculates the processing and scanning conditions under which the specimen is processed by the focused ion beam, according to the selected-optical conditions. The system further includes a setting condition data output portion for outputting data based on the optical conditions and processing and scanning conditions selected and calculated by the arithmetic unit. The system further includes a FIB driver portion for driving the condenser lenses, beam-blanking electrodes, apertures, deflecting electrodes, and objective lens based on the optical conditions and processing and scanning conditions outputted from the data output portion.


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