The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Sep. 20, 2004
Masayoshi Shiga, Kyoto, JP;
Kenji Hashinoki, Kyoto, JP;
Yasufumi Koyama, Kyoto, JP;
Abstract
A substrate processing apparatus for performing a resist coating process and a development process includes an inspection block for making an inspection on a substrate having undergone the development process. The inspection block has an inspection unit for making a predetermined inspection and a transport robot for transferring a substrate to and from the inspection unit. When a substrate to be inspected is transported to the inspection block, the transport robot transports the substrate to the inspection unit. When a substrate not to be inspected is transported to the inspection block, the transport robot transports the substrate directly to the outlet of the inspection block. At this time, a substrate not to be inspected is allowed to pass a preceding substrate to be inspected, at the inspection block. Thus provided is a substrate processing apparatus capable of improving the transport efficiency, to thereby achieve a higher throughput.