The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7525639 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 28, 2009

Filed:

Dec. 15, 2005
Applicant:

Akihiro Yamada, Utsunomiya, JP;

Inventor:

Akihiro Yamada, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for exposing a pattern of a reticle onto a plate includes a projection optical system for projecting the pattern onto the plate, a switch for switching a polarization of a light for illuminating the reticle from a first polarization state to a second polarization state different from the first polarization state, and an adjuster for adjusting an aberration of the projection optical system when the switch switches the polarization of the light from the first polarization state to the second polarization state.


Find Patent Forward Citations

Yamada, Akihiro. (2009). Exposure apparatus and method, and device manufacturing method using the same (U.S. Patent No. 7525639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7525639

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