The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Sep. 08, 2005
Applicants:
Wen-kuang Lin, Hsinchu, TW;
Huan-hsin Yeh, Cyonglin Township, Hsinchu County, TW;
Chung-an Chen, Taichung, TW;
Inventors:
Wen-Kuang Lin, Hsinchu, TW;
Huan-Hsin Yeh, Cyonglin Township, Hsinchu County, TW;
Chung-An Chen, Taichung, TW;
Assignee:
United Microelectronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography, thereby improving the alignment accuracy of the lithography process.