The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2009

Filed:

Oct. 28, 2004
Applicants:

Tao Sun, Naperville, IL (US);

Robert Medsker, Yorkville, IL (US);

Inventors:

Tao Sun, Naperville, IL (US);

Robert Medsker, Yorkville, IL (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/04 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a polishing composition comprising fumed alumina, alpha alumina, silica, a nonionic surfactant, a metal chelating organic acid, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, and abrading at least a portion of the substrate to polish the substrate.


Find Patent Forward Citations

Sun, Tao. (2009). Cmp composition comprising surfactant (U.S. Patent No. 7524347). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7524347

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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