The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Jul. 30, 2004
Ana Tessadro, Seattle, WA (US);
Ana Tessadro, Seattle, WA (US);
Mitutoyo Corporation, Kawasaki-shi, JP;
Abstract
A method of measuring occluded features in machine vision metrology. The method allows for high precision measurement of features that are partially obscured by an extraneous object (e.g., an overlay grid of a flat panel display screen mask). The method first roughly locates the edge points of the feature to measure. In one embodiment, the rough edge location is performed by using morphology filters to delete the extraneous object (e.g., the grid) and then doing edge detection on the filtered image. Once the rough edge locations are determined, the method then returns to the original unaltered image and for each of the roughly located edge points does edge detection in a close neighborhood of the point in the original unaltered image. These refined edge points are then used to fit the feature for highly precise measurements.