The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Jul. 30, 2004
Mohamad T. Krounbi, San Jose, CA (US);
Yining HU, Fremont, CA (US);
Ming Zhao, Fremont, CA (US);
Kenneth Kung, Saratoga, CA (US);
Mark D. Thomas, Hollister, CA (US);
Kroum S. Stoev, Pleasanton, CA (US);
Francis H. Liu, Fremont, CA (US);
Marcos M. Lederman, San Francisco, CA (US);
Mohamad T. Krounbi, San Jose, CA (US);
Yining Hu, Fremont, CA (US);
Ming Zhao, Fremont, CA (US);
Kenneth Kung, Saratoga, CA (US);
Mark D. Thomas, Hollister, CA (US);
Kroum S. Stoev, Pleasanton, CA (US);
Francis H. Liu, Fremont, CA (US);
Marcos M. Lederman, San Francisco, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A head including a write element for writing data to a magnetic media, and methods for its production are provided. A write element of the invention includes one or more of a recessed first pole, a heat sink layer, and a shortened yoke length. A method of the invention provides forming an anti-reflective layer before forming a mask layer. During photolithography the anti-reflective layer suppresses undesirable reflections off of features, such as vertical sidewalls, that otherwise limit how closely to such features portions of the mask layer can be formed.