The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Jun. 29, 2005
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eksel, BE;
Marco Koert Stavenga, Eindhoven, NL;
Thijs Harink, Eindhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eksel, BE;
Marco Koert Stavenga, Eindhoven, NL;
Thijs Harink, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.