The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Sep. 14, 2006
Antonie Hendrik Verweij, Dussen, NL;
Edwin Johan Buis, Belfeld, NL;
Hans Butler, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam; a support constructed to support a first and a second patterning device, each patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the illumination system includes a radiation beam path adaptation device, wherein the adaptation device is configured to adapt a radiation beam path to allow subsequent projections of a pattern of the first patterning device and a pattern of the second patterning device during a single scanning movement of the patterning device support.