Method of fabricating field emission arrays employing a hard mask to define column lines and another mask to define emitter tips and resistors

Abstract

Each pixel of a field emission device includes a resistor with at least one emitter tip thereover and at least one substantially vertically oriented conductive element positioned adjacent the resistor. In a field emission array, a conductive element may contact each resistor of a line of pixels. A method for fabricating the field emission array includes forming a plurality of substantially parallel conductive lines, depositing at least one layer of semiconductive or conductive material over and laterally adjacent each conductive line, and forming a hard mask in recesses of the surface of the uppermost material layer. The underlying material layer or layers are patterned through the hard mask, exposing substantially longitudinal center portions of the conductive lines. The remaining semiconductive or conductive material is patterned to form the emitter tips and resistors. At least the substantially central longitudinal portions of the conductive traces are removed to form the conductive elements.