The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Mar. 05, 2004
Eric Gerardus Theodoor Bosch, Eindhoven, NL;
Jeroen Jonkers, Aachen, DE;
Willi Neff, Kelmis, BE;
Günther Hans Derra, Aachen, DE;
Eric Gerardus Theodoor Bosch, Eindhoven, NL;
Jeroen Jonkers, Aachen, DE;
Willi Neff, Kelmis, BE;
Günther Hans Derra, Aachen, DE;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate () is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate ().