The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2009

Filed:

Aug. 16, 2004
Applicants:

Kazuyoshi Hosaka, Funabashi, JP;

Mariko Shudo, Funabashi, JP;

Masayoshi Suzuki, Funabashi, JP;

Inventors:

Kazuyoshi Hosaka, Funabashi, JP;

Mariko Shudo, Funabashi, JP;

Masayoshi Suzuki, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a dye-containing resist composition comprising a ketol solvent; a negative type resist composition comprising a resin, a photoacid generator or a photobase generator, a crosslinking compound, a dye and a ketol solvent; a negative type resist composition comprising a resin, a photoradical generator, a crosslinking compound, a dye and a ketol solvent; a positive type resist composition comprising a resin, a photoacid generator, a crosslinking compound, a dye and a ketol solvent. The ketol is preferably β-hydroxyketone, more preferably 4-hydroxy-4-methyl-2-pentanone. The resist composition does not occur problems such as occurrence of foreign matters (particles) even when the concentration of dye is increased, and enables the production of color filters in a shape of thinner film.


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