The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Oct. 23, 2007
Applicants:
Jun Hatakeyama, Joetsu, JP;
Wataru Kusaki, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Takao Yoshihara, Joetsu, KR;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Wataru Kusaki, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Takao Yoshihara, Joetsu, KR;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.