The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Jun. 24, 2004
Johannes Teunis Zuilhof, Bennekom, NL;
Klaus Simon, Eindhoven, NL;
Ernst Jan Robert Sudholter, Dell, NL;
Qiao-yu Sun, Wageningen, NL;
Johannes Teunis Zuilhof, Bennekom, NL;
Klaus Simon, Eindhoven, NL;
Ernst Jan Robert Sudholter, Dell, NL;
Qiao-Yu Sun, Wageningen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Wageningen University, Wageningen, NL;
Abstract
A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.