The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2009

Filed:

Nov. 10, 2005
Applicant:

Jan Hauschild, Eindhoven, NL;

Inventor:

Jan Hauschild, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at least one reflective device to produce a projected projection beam of radiation onto the target portion, and producing a first projected projection beam of radiation onto the target object using the at least one reflective device in a first orientation. The invention further includes using a tilting device for tilting the at least one reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, producing a second projected projection beam of radiation onto the target object, determining a lateral shift of the first and second projected projection beams on the target object, and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.


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