The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Feb. 07, 2006
Lithographic apparatus, calibration method, device manufacturing method and computer program product
Applicants:
Jeffrey Godefridus Cornelis Tempelaars, Eindhoven, NL;
Gerardus Carolus Johannus Hofmans, Eindhoven, NL;
Rene Oesterholt, 's-Hertogenbosch, NL;
Jan Hauschild, Eindhoven, NL;
Hans Erik Kattouw, Nijmegen, NL;
Inventors:
Jeffrey Godefridus Cornelis Tempelaars, Eindhoven, NL;
Gerardus Carolus Johannus Hofmans, Eindhoven, NL;
Rene Oesterholt, 's-Hertogenbosch, NL;
Jan Hauschild, Eindhoven, NL;
Hans Erik Kattouw, Nijmegen, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.