The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Mar. 29, 2005
Applicants:
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Barrie Dudley Brewster, Sussex, GB;
Robert Gordon Livesey, West Sussex, GB;
Inventors:
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Barrie Dudley Brewster, Sussex, GB;
Robert Gordon Livesey, West Sussex, GB;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus includes a patterning device for patterning a beam of radiation, a projection system for projecting the patterned beam of radiation onto a substrate, a gas purged sealing aperture extending between different zones of the apparatus, and a gas supply arrangement for supplying a mixture of at least argon and hydrogen to the sealing aperture.