The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2009

Filed:

Jul. 03, 2003
Applicants:

Yu-chou Lee, Shu-Lin, TW;

Tsung-chi Cheng, Taichung, TW;

Inventors:

Yu-Chou Lee, Shu-Lin, TW;

Tsung-Chi Cheng, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/04 (2006.01); H01L 31/036 (2006.01); H01L 31/0376 (2006.01); H01L 31/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thin film transistor source/drain structure and the manufacturing method thereof are disclosed. The thin film transistor source/drain structure uses a sandwich structure to reduce the resistivity of the source/drain and upgrade the reliability. The sandwich structure preferably comprises a structure of AlNdN alloy/AlNd alloy/AlNdN alloy. The AlNdN alloy is used as a buffer layer or a diffusion barrier to prevent the AlNd alloy and an amorphous silicon layer from diffusing into each other. The other AlNdN alloy is used as a glue layer and to protect the AlNd alloy from being over-etched. The other AlNdN alloy can also prevent the AlNd alloy and the following formed ITO from contact and interaction.


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