The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Sep. 20, 2006
Meiki Ooseki, Minami-Ashigara, JP;
Kiyofumi Yamamoto, Minami-Ashigara, JP;
Masamichi Hara, Minami-Ashigara, JP;
Meiki Ooseki, Minami-Ashigara, JP;
Kiyofumi Yamamoto, Minami-Ashigara, JP;
Masamichi Hara, Minami-Ashigara, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The present invention provides a method of cleaning a cover glass having a spacer which is to be incorporated in a solid image pickup device, comprising: a dry cleaning step performed after dry etching; a wipe-off cleaning step performed after the dry cleaning step; a primary wet cleaning step performed after the wipe-off cleaning step; and a secondary wet cleaning step performed after the primary wet cleaning step, wherein the cover glass having a spacer is fabricated by a manufacturing process including the steps of: bonding a spacer substrate to a glass substrate with an adhesive; applying a photoresist to the spacer substrate; exposing and developing the photoresist by use of a photomask and forming an etching mask corresponding to the spacer on the spacer substrate; and forming a spacer on the glass substrate by the dry etching the spacer substrate.