The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Jun. 23, 2004
Burn Jeng Lin, Hsinchu, TW;
Tsai-sheng Gau, Hsinchu, TW;
Chun-kung Chen, Chunli, TW;
Ru-gun Liu, Hsinchu, TW;
Shing Shen Yu, Hsinchu, TW;
Jen Chieh Shih, Yongkang, TW;
Burn Jeng Lin, Hsinchu, TW;
Tsai-Sheng Gau, Hsinchu, TW;
Chun-Kung Chen, Chunli, TW;
Ru-Gun Liu, Hsinchu, TW;
Shing Shen Yu, Hsinchu, TW;
Jen Chieh Shih, Yongkang, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
An immersion lithography system is disclosed to comprise a fluid containing feature for providing an immersion fluid for performing immersion lithography on a wafer, and a seal ring covering a predetermined portion of a wafer edge for preventing the immersion fluid from leaking through the covered portion of the wafer edge while the fluid is used for the immersion lithography.