The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Jun. 01, 2004
Applicants:
LI Hou, Cupertino, CA (US);
Qunhua Wang, San Jose, CA (US);
Edwin Sum, Danville, CA (US);
John M. White, Hayward, CA (US);
Inventors:
Li Hou, Cupertino, CA (US);
Qunhua Wang, San Jose, CA (US);
Edwin Sum, Danville, CA (US);
John M. White, Hayward, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a first aspect, a method is provided for use during plasma processing. The first method includes the steps of (1) placing a substrate on a substrate holder of a plasma chamber; (2) positioning a cover frame adjacent and below a perimeter of the substrate; and (3) employing the cover frame to reduce arcing during plasma processing within the plasma chamber. Numerous other aspects are provided.