The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7499767 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 03, 2009

Filed:

Nov. 21, 2006
Applicants:

Shinichi Kurita, San Jose, CA (US);

Emanuel Beer, San Jose, CA (US);

Inventors:

Shinichi Kurita, San Jose, CA (US);

Emanuel Beer, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.


Find Patent Forward Citations

Kurita, Shinichi. (2009). Methods and apparatus for positioning a substrate relative to a support stage (U.S. Patent No. 7499767). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7499767

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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