The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2009
Filed:
Jun. 29, 2004
Toshiya Kotani, Machida, JP;
Suigen Kyoh, Yokohama, JP;
Shinji Yamaguchi, Yokohama, JP;
Soichi Inoue, Yokohama, JP;
Toshiya Kotani, Machida, JP;
Suigen Kyoh, Yokohama, JP;
Shinji Yamaguchi, Yokohama, JP;
Soichi Inoue, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
There is disclosed a method for inspecting a defect in a photomask which is produced by using a graphic data, that matches mask data or is produced by subjecting mask data to correction of a process conversion difference relating to at least a line width. The method includes the following steps. Inspection data is produced by correcting a pattern of mask data so as to substantially match a planar shape of a pattern of a photomask to be produced by using the graphic data. A pattern of a produced photomask is compared with a pattern of the inspection data. Portions where planar shapes of the pattern of the inspection data and the pattern of the produced photomask do not match are extracted. A defect is distinguished from the portions where the planer shapes do not match.