The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Jun. 22, 2007
Applicants:
Malgorzata Jurczak, Leuven, BE;
Rita Rooyackers, Kessel-lo, BE;
Nadine Collaert, Blanden, BE;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is disclosed for relaxing strain in a multi-gate device, the method comprising providing a substrate with a strained material, patterning a plurality of fins in the strained material, defining a first region comprising at least one fin, defining a second region comprising at least one fin, providing a diffusion barrier layer on the first region, performing a hydrogen anneal such that the strain in the second region is relaxed.