The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Jul. 29, 2004
Tadamitsu Miyazaki, Kanagawa, JP;
Kazuya Hirayama, Kanagawa, JP;
Hisaya Fukunaga, Kanagawa, JP;
Hiroyasu Futamura, Kanagawa, JP;
Tadamitsu Miyazaki, Kanagawa, JP;
Kazuya Hirayama, Kanagawa, JP;
Hisaya Fukunaga, Kanagawa, JP;
Hiroyasu Futamura, Kanagawa, JP;
Sumco Techxiv Corporation, Nagasaki, JP;
Abstract
Disclosed are a method and apparatus for etching disk-shaped members, especially a method and apparatus for etching semiconductor wafers. In a method wherein wafers () are rotated and etched in an etching chamber () which is filled with an etching solution, a non-rotating cell plate () is disposed between two rotating wafers (). In an etching apparatus wherein multiple wafers () are supported and rotated by a rod (), the cell plate () is disposed between each two wafers (). The cell plate () has a surface area roughly equivalent to that of the wafer ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile