The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
Feb. 14, 2005
Hua Zhang, Evanston, IL (US);
Robert Elghanian, Wilmette, IL (US);
Linette Demers, Evanston, IL (US);
Nabil Amro, Chicago, IL (US);
Sandeep Disawal, Chicago, IL (US);
Sylvain Cruchon-dupeyrat, Chicago, IL (US);
Hua Zhang, Evanston, IL (US);
Robert Elghanian, Wilmette, IL (US);
Linette Demers, Evanston, IL (US);
Nabil Amro, Chicago, IL (US);
Sandeep Disawal, Chicago, IL (US);
Sylvain Cruchon-Dupeyrat, Chicago, IL (US);
Nanoink, Inc., Chicago, IL (US);
Abstract
A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e.g., polydimethylsiloxane (PDMS), etc.). This kind of tip adsorbs chemicals ('inks') easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (μCP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the μCP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional SiNprobe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid 'ink') onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step. Inks comprising metals and sol-gel materials are noted, as well as applications in photomask repair, enhancement, and fabrication.