The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Dec. 28, 2005
Arnoud Cornelis Wassink, Veldhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Arnoud Cornelis Wassink, Veldhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.