The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2009

Filed:

Nov. 12, 2004
Applicants:

Kelly D. Linden, Lynnwood, WA (US);

Mark P. Helsel, Seattle, WA (US);

Dean R. Brown, Lynnwood, WA (US);

Randall B. Sprague, Carnation, WA (US);

Wyatt O. Davis, Bothell, WA (US);

Inventors:

Kelly D. Linden, Lynnwood, WA (US);

Mark P. Helsel, Seattle, WA (US);

Dean R. Brown, Lynnwood, WA (US);

Randall B. Sprague, Carnation, WA (US);

Wyatt O. Davis, Bothell, WA (US);

Assignee:

Microvision, Inc., Redmond, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Devices are formed on a semiconductor wafer in an interdigitated relationship and are released by deep reactive ion etching. MEMS scanners are formed without a surrounding frame. Mounting pads extend outward from torsion arms. Neighboring MEMS scanners are formed with their mounting pads interdigitated such that a regular polygon cannot be formed around a device without also intersecting a portion of one or more neighboring devices. MEMS scanners may be held in their outlines by a metal layer, by small semiconductor bridges, or a combination.


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