The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2009

Filed:

Apr. 17, 2006
Applicants:

Jean-christophe Giraudin, Bernin, FR;

Sébastien Cremer, Sassenage, FR;

Philippe Delpech, Meylan, FR;

Inventors:

Jean-Christophe Giraudin, Bernin, FR;

Sébastien Cremer, Sassenage, FR;

Philippe Delpech, Meylan, FR;

Assignee:

STMicroelectronics S.A., Montrouge, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8242 (2006.01); H01L 29/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A capacitor fabricated, within an integrated circuit, has at least two capacitive trenches extending within a dielectric material. A metal layer is produced which is embedded in the dielectric material. To form the capacitor, the dielectric material is etched, with etching stopped at the metal layer so as to form the trenches. A layer of conductive material forming the lower electrode of the capacitor is then deposited at least on the sidewalls of the trenches and in contact with the metal layer. A dielectric layer is then deposited within the trenches. A layer of conductive material forming the upper electrode of the capacitor is then deposited within the trenches.


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