The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Oct. 07, 2005
Shinichiro Koga, Utsunomiya, JP;
Shinichiro Koga, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure method of exposing a substrate arranged on a stage, which holds the substrate and moves, to light through an original and a projection optical system. A first measurement is performed for measuring a first drive characteristic of the stage by detecting a position of a pattern on the stage using a first detection system, which detects a position of a pattern on the substrate through an optical system, which does not include the projection optical system, a second measurement is performed for measuring a second drive characteristic of the stage by detecting the position of the pattern on the stage using a second detection system, which detects the position of the pattern on the stage through the projection optical system, and the original and the substrate are aligned based on the first and second drive characteristics.