The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Oct. 04, 2005
Bianca Schreder, Frankfurt, DE;
Rainer Liebald, Nauheim, DE;
Edgar Pawlowski, Stadecken-Elsheim, DE;
Dirk Sprenger, Stadecken-Elsheim, DE;
Dietrich Mund, Obersuessbach, DE;
Juergen Leib, Freising, DE;
Bianca Schreder, Frankfurt, DE;
Rainer Liebald, Nauheim, DE;
Edgar Pawlowski, Stadecken-Elsheim, DE;
Dirk Sprenger, Stadecken-Elsheim, DE;
Dietrich Mund, Obersuessbach, DE;
Juergen Leib, Freising, DE;
Schott AG, Mainz, DE;
Abstract
In the method for microstructuring flat glass substrates a substrate surface of a glass substrate is coated with at least one structured mask layer and subsequently exposed to a chemically reactive ion etching process (RIE) with at least one chemical etching gas. In order to provide the same or a higher quality etching and etching rate even for economical types of glass the chemical etching gas is mixed with at least one noble gas, so that the proportion of sputtering etching in the ion etching process is significantly increased.