The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2009

Filed:

Jul. 11, 2006
Applicants:

Yukio Morishige, Tokyo, JP;

Hiroshi Morikazu, Tokyo, JP;

Toshio Tsuchiya, Tokyo, JP;

Koichi Takeyama, Tokyo, JP;

Inventors:

Yukio Morishige, Tokyo, JP;

Hiroshi Morikazu, Tokyo, JP;

Toshio Tsuchiya, Tokyo, JP;

Koichi Takeyama, Tokyo, JP;

Assignee:

Disco Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/08 (2006.01); B23K 26/40 (2006.01); B23K 15/08 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A laser processing apparatus comprising a chuck table, laser beam irradiation means for irradiating a workpiece held on the chuck table with a laser beam, and processing feed means for processing-feeding the chuck table and the laser beam irradiation means relative to each other. The laser beam irradiation means includes first laser beam irradiation means for throwing a first pulsed laser beam having a wavelength in the intermediate-infrared radiation region, and second laser beam irradiation means for throwing a second pulsed laser beam having a wavelength in the ultraviolet radiation region. The first laser beam irradiation means and the second laser beam irradiation means are set such that at least a part, in the processing feed direction, of the focus spot of the second pulsed laser beam overlaps the focus spot of the first pulsed laser beam.


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