The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Aug. 29, 2003
Jane Frommer, San Jose, CA (US);
Robert D. Miller, San Jose, CA (US);
Craig Hawker, Santa Barbara, CA (US);
Urs T. Duerig, Rueschlikon, CH;
Bernd W Gotsmann, Horgen, CH;
Peter Vettiger, Langnau Am Albis, CH;
Gerd K. Binnig, Wollerau, CH;
Victor Yee-way Lee, San Jose, CA (US);
Jane Frommer, San Jose, CA (US);
Robert D. Miller, San Jose, CA (US);
Craig Hawker, Santa Barbara, CA (US);
Urs T. Duerig, Rueschlikon, CH;
Bernd W Gotsmann, Horgen, CH;
Peter Vettiger, Langnau Am Albis, CH;
Gerd K. Binnig, Wollerau, CH;
Victor Yee-Way Lee, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method reading, writing, and erasing data includes bringing a thermal-mechanical probe into proximity with a layer of cross-linked polymeric material to induce a deformed region at a point in the film, thereby writing information; bringing a thermal-mechanical probe into proximity with the deformed region, thereby reading information; and bringing a thermal-mechanical probe into proximity with the deformed region, further deforming it in such a way to eliminate the deformed region, thereby erasing the information; and repeating the storing, reading, and erasing steps at points in the film.