The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Feb. 01, 2005
Takehiko Nishikawa, Saitama, JP;
Soichiro Fujinaga, Saitama, JP;
Takehiko Nishikawa, Saitama, JP;
Soichiro Fujinaga, Saitama, JP;
Lintec Corporation, Tokyo, JP;
Abstract
A material film for a mask film comprising a substrate film transmitting ultraviolet light and a resin layer not transmitting ultraviolet light disposed on one face of the substrate film, the resin layer having a color which can be eliminated by irradiation with laser beams, a transmittance of ultraviolet light of 0.1% or smaller, a thickness of 0.1-30 μm and an average surface roughness on a central line Ra of 0.1-3 μm and comprising carbon black having an average particle diameter of 20-50 nm and a specific surface area of 70-150 m/g. The resin layer exhibits uniform transparency at portions the color of which is eliminated and suppresses formation of scratches. The mask film is easily positioned in preparation of great printing plates and good contact is easily attained throughout the entire surface suppressing containment of air between the mask film and the printing plate material.