The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
Oct. 12, 2006
Michael B. Binnard, Belmont, CA (US);
Douglas C. Watson, Campbell, CA (US);
W. Thomas Novak, Hillsborough, CA (US);
Hiroto Horikawa, Kumagaya, JP;
Yoshifumi Nakakoji, Kumagaya, JP;
Hideaki Sakamoto, Kumagaya, JP;
Michael B. Binnard, Belmont, CA (US);
Douglas C. Watson, Campbell, CA (US);
W. Thomas Novak, Hillsborough, CA (US);
Hiroto Horikawa, Kumagaya, JP;
Yoshifumi Nakakoji, Kumagaya, JP;
Hideaki Sakamoto, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.