The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
May. 20, 2005
Applicant:
Tai-yuan Huang, Kaohsiung, TW;
Inventor:
Tai-Yuan Huang, Kaohsiung, TW;
Assignee:
Advanced Semiconductor Engineering, Inc., Kaohsiung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
A structure and method of forming a metal buffering layer during the formation of a redistribution layer is provided. It only changes a mask to form the metal buffering layer and circuit traces simultaneously. The metal buffering layer can increase the flatness of the dielectric layer covering on the metal buffering layer. It can also make the structure under the metal buffering layers suffer uniform pressure to prevent the passivation layer from cracking and the circuit traces from collapsing in order to increase the yield of the packaged chips.