The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2008

Filed:

Jun. 28, 2005
Applicant:

Jang-eun Heo, Seoul, KR;

Inventor:

Jang-Eun Heo, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An integrated circuit device includes a storage cell including an upper electrode and a lower electrode on a substrate, and a conductive hard mask pattern directly on the upper electrode of the storage cell opposite the lower electrode. The upper electrode is formed of a metal softer than the conductive hard mask pattern. The device further includes an interlayer on the substrate having an alignment key recess therein. The alignment key recess extends towards the substrate beyond a depth of the upper electrode. An alignment key pattern may extend towards the substrate beyond the depth of the upper electrode on opposing sidewalls and on a surface therebetween of the alignment key recess. The alignment key pattern may have a distinct step difference between portions thereof on the opposing sidewalls and portions thereof on the surface therebetween. Related methods are also discussed.


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