The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2008

Filed:

Feb. 24, 2004
Applicants:

Vincent J. Messina, Pelham, NH (US);

Donald J. Ronning, Pelham, NH (US);

Inventors:

Vincent J. Messina, Pelham, NH (US);

Donald J. Ronning, Pelham, NH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An inspection process and an inspection system () that utilize a plurality of residual defect signals(),(), . . .() to identify and report defects of interest in a copy () of a standard (). The process includes performing a multi-variant defect extraction method () that includes applying a number n of pre-determined transforms to both a data file () containing the standard and an image file () containing the copy of the standard so as to create a plurality of conditioned data files ((),(), . . .()) and a plurality of conditioned image files ((),(), . . .()). The plurality of residual defect signals are extracted from these conditioned files. A defect analysis and reporting method () utilizes the residual defect signals to report defects contained in two or more of the residual defect signals.


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