The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Mar. 19, 2004
Hans-juergen Brueck, Munich, DE;
Gerd Scheuring, Munich, DE;
Hans-Juergen Brueck, Munich, DE;
Gerd Scheuring, Munich, DE;
Abstract
The invention relates to a method for optical measurement of an OPC structure (), having a pre-determined structure () on a photo-mask, in order to determine a measurement of the structure in at least one direction, whereby, firstly, a region () is determined on the photo-mask, which comprises the OPC structure () to be measured. The intensity of the determined region () is then scanned in a first direction and the region in which the intensity passes a threshold is determined for each scan. The maximum separation between an edge () of the structure () and an edge () of the corresponding OPC structure () is determined, based on the difference of the determined regions.