The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Dec. 30, 2005
Applicants:
Rob Adrianus Antonius Maria Bastiaensen, Zundert, NL;
Marcel Maurice Hemerik, Helmond, NL;
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Jacob Sonneveld, Best, NL;
Inventors:
Rob Adrianus Antonius Maria Bastiaensen, Zundert, NL;
Marcel Maurice Hemerik, Helmond, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Jacob Sonneveld, Best, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.