The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Nov. 14, 2003
Hideaki Yamasaki, Nirasaki, JP;
Kazuhito Nakamura, Nirasaki, JP;
Koumei Matsuzawa, Nirasaki, JP;
Tsukasa Matsuda, Nirasaki, JP;
Yumiko Kawano, Nirasaki, JP;
Hideaki Yamasaki, Nirasaki, JP;
Kazuhito Nakamura, Nirasaki, JP;
Koumei Matsuzawa, Nirasaki, JP;
Tsukasa Matsuda, Nirasaki, JP;
Yumiko Kawano, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A cleaning method of a substrate processor that reduces damage to a member in a substrate processing container. The method of cleaning the substrate processing container of the substrate processor that processes a target substrate according to the present invention includes: introducing gas into a remote plasma generating unit of the substrate processor; exciting the gas by the remote plasma generating unit, and generating reactive species; and supplying the reactive species to the processing container from the remote plasma generating unit, and pressurizing the processing container at 1333 Pa or greater.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile