The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2008

Filed:

May. 01, 2006
Applicants:

Mamoru Nakano, Yokkaichi, JP;

Yukio Yamaguchi, Yokkaichi, JP;

Teruhisa Kitagawa, Yokkaichi, JP;

Rikito Sato, Yokkaichi, JP;

Naoki Hatakeyama, Yokkaichi, JP;

Inventors:

Mamoru Nakano, Yokkaichi, JP;

Yukio Yamaguchi, Yokkaichi, JP;

Teruhisa Kitagawa, Yokkaichi, JP;

Rikito Sato, Yokkaichi, JP;

Naoki Hatakeyama, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polycrystalline silicon rod according to present invention has a structure for hanging of polycrystalline silicon rods to each other end-to-end, so that the efficiency of melting polycrystalline silicon can be increased considerably. A polycrystalline silicon rod obtained by entirely or partially removing a peripheral portion from the rod to leave a central portion, and processing the central portion, preferably, the peripheral portion is removed by grinding in an amount corresponding to 10 to 60% of the diameter of the rod, and then subjected to groove-forming processing. This makes annealing unnecessary.


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Nakano, Mamoru. (2008). Polycrystalline silicon rod and method for processing the same (U.S. Patent No. 7455731). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7455731

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