The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2008

Filed:

Apr. 21, 2004
Applicants:

Daniel R. Neal, Tijeras, NM (US);

Richard James Copland, Albuquerque, NM (US);

David A. Neal, Albuquerque, NM (US);

Inventors:

Daniel R. Neal, Tijeras, NM (US);

Richard James Copland, Albuquerque, NM (US);

David A. Neal, Albuquerque, NM (US);

Assignee:

AMO Wavefront Sciences, LLC, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for mapping a three-dimensional structure includes a projecting optical system adapted to project light onto an object, a correction system adapted to compensate the light for at least one aberration in the object, an imaging system adapted to collect light scattered by the object and a wavefront sensor adapted to receive the light collected by the imaging system and to sense a wavefront of the received light. For highly aberrated structures, a number of wavefront measurements are made which are valid over different portions of the structure, and the valid wavefront data is stitched together to yield a characterization of the total structure.


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