The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2008
Filed:
Apr. 05, 2007
Applicant:
Chih-ming Chiang, Hsinchu County, TW;
Inventor:
Chih-Ming Chiang, Hsinchu County, TW;
Assignee:
United Microelectronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for detecting a tilt or a shift of a wafer on a hot plate is described. A temperature variation of the hot plate is measured directly after the wafer is transferred onto the hot plate. The temperature variation is analyzed to determine whether or not a tilt or a shift of the wafer has occurred.
Quick Actions:
Chiang, Chih-Ming. (2008). Method and system for detecting tilt or shift of wafer transferred onto hot plate in real time, and method system for monitoring baking process of wafers in real time (U.S. Patent No. 7454307). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7454307
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile