The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Apr. 10, 2006
Ruei-hung Jang, Jhubi, TW;
Ya-wen Lee, Taichung, TW;
Tzu-yang Wu, Hsinchu, TW;
Sheng-liang Pan, Hsin-Chu, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Tsai-sheng Gau, Hsin-Chu, TW;
Ruei-Hung Jang, Jhubi, TW;
Ya-Wen Lee, Taichung, TW;
Tzu-Yang Wu, Hsinchu, TW;
Sheng-Liang Pan, Hsin-Chu, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Tsai-Sheng Gau, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.